PLUTO-2.1-NIRO-023德國(guó)HOLOEYE僅限相位LCOS-SLM PLUTO-2.1-NIRO-023德國(guó)HOLOEYE僅限相位LCOS-SLM PLUTO-2.1-NIRO-023德國(guó)HOLOEYE僅限相位LCOS-SLM
德國(guó)HOLOEYE空間光調(diào)制器，衍射光學(xué)元件，如有需要請(qǐng)聯(lián)系盛經(jīng)理
產(chǎn)品負(fù)責(zé)人：盛經(jīng)理 131,8972,4065
工作---Q:1483258941
德國(guó)HOLOEYE的空間光調(diào)制器（SLM）系統(tǒng)基于半透明或反射式液晶微顯示器。HOLOEYE為振幅和相位調(diào)制提供了廣泛的空間光調(diào)制器。
液晶空間光調(diào)制器的光子應(yīng)用
Holoeye Photonics AG與Fraunhofer IZM合作開展一個(gè)由歐洲區(qū)域發(fā)展（ERDF）共同資助的項(xiàng)目！翱臻g光調(diào)制器（PALM）的光子應(yīng)用”
項(xiàng)目的目標(biāo)是開發(fā)用于紫外和SWIR波段的LCOS（硅上液晶）電池。
在促進(jìn)研究、創(chuàng)新和技術(shù)（利潤(rùn)）方案下計(jì)劃的聯(lián)合項(xiàng)目是以主要在弗勞恩霍夫工業(yè)區(qū)（包開發(fā)）開展的以研究為導(dǎo)向的工作包以及過(guò)程和結(jié)果分析的可能性為基礎(chǔ)。
Holoeye Photonics AG將您的系統(tǒng)知識(shí)集成到自己的工作包中，專注于以市場(chǎng)為導(dǎo)向?qū)崿F(xiàn)所獲得的知識(shí)。
衍射光學(xué)元件
標(biāo)準(zhǔn)DOE（塑料）
DOE Item # Specs Description Design Wavel. a b c d α β γ δ Optimum Wavelength Range Image
DE-R 213 11 Lines, Square 635 nm* 76.7 mm 54.4 mm 5.4 mm 54.4 mm 42.0° 30.4° 3.0° 30.4°
DE-R 233 7 Lines, Square 635 nm* 54.0 mm 38.2 mm 6.4 mm 38.2 mm 30.2° 21.6° 3.6° 21.6°
DE-R 250 5 Lines (Rectangular) 660 nm* 55.0 mm 10.9 mm 2.7 mm 53.9 mm 30.8° 6.2° 1.6° 30.2°
DE-R 251 7 Lines (Rectangular) 650 nm 15.5 mm 9.0 mm 1.5 mm 12.6 mm 8.9° 5.2° 0.8° 7.2°
DE-R 252 5 Lines (Square) 635 nm* 42.7 mm 30.2 mm 7.5 mm 30.2 mm 24.1° 17.2° 4.3° 17.2°
DE-R 253 11 Lines (Square,
Thin Lines) 635 nm* 76.4 mm 54.0 mm 5.4 mm 54.0 mm 41.8° 30.2° 3.0° 30.2° 530 – 670 nm
DE-R 254 25 Lines (Square) 660 nm* 68.4 mm 48.3 mm 2.0 mm 48.3 mm 37.7° 27.2° 1.1° 27.2°
DE-R 255 65 Lines (Square,
Central Line Thicker) 660 nm* 45.6 mm 32.2 mm 0.5 mm 32.2 mm 25.7° 18.3° 0.3° 18.3° 530 – 670 nm
DE-R 284 41 Lines (Rectangular) 660 nm* 133.4 mm 104.0 mm 2.6 mm 78.0 mm 67.4° 54.9° 1.4°
DE-R 348 10 Lines (Rectangular) 650 nm* 125.5 mm 90.0 mm 10.0 mm 87.5 mm 64.2° 48.5° 5.4°
DE-R 350 15 Lines (Rectangular) 520 nm* 65.5 mm 42.1 mm 3.0 mm 50.2 mm 36.3° 23.8° 1.7°
DE-R 381 11 Lines (Rectangular) 850 nm* 155.6 mm 41.5 mm 4.15 mm 150 mm 75.8° 23.5° 2.3°
DE-R 386
DE-R 387
DE-R 391 81 Lines (Rectangular) 650 nm* 156.0 mm 128.8 mm 1.6 mm 93.6 mm 75.9° 63.9° 0.8°
DE-R 392 3 Lines (Rectangular) 660 nm* 54.7 mm 10.8 mm 5.4 mm 53.6 mm 30.6° 6.2° 3.1° 30.0°
*Large-angle pattern that due to its symmetry properties is subject to geometrical distortion, if the DOE is used at laser wavelengths significantly different (Δλ > 50nm) from the design wavelength.
Lines & Dot Lines
Pattern Size @ 100 mm Distance (@ Design Wavelength) Pattern Angles (@ Design Wavelength)
DOE Item # Specs Description Design Wavelength a b α β Optimum Wavelength Range Image
DE-R 263 1:5 Dot Line 635 nm 10.5 mm 2.6 mm 6° 1.5° 450 – 700 nm
DE-R 264 1:9 Dot Line 670 nm 1.6 mm 0.2 mm 0.9° 0.1° 630 – 780 nm
DE-R 265 1:19 Dot Line 650 nm 24 mm 1.3 mm 13.7° 0.8° 500-540 nm; 630-690 nm
DE-R 266 QC-Line – 5@633 633 nm 8.7 mm — 5° — 630 – 690 nm
DE-R 267 QC-Line – 30@532 532 nm 53.8 mm — 30.1° — 470 – 560 nm
DE-R 281 1:11 Dot Line 650 nm 28.9 mm 2.9 mm 16.5° 1.6° 440-490 nm; 600-730 nm
DE-R 282 1:99 Dot Line 660 nm 33.7 mm 0.3 mm 19.1° 0.2° 600 – 700 nm
DE-R 283 QC-Line – 20@633 633 nm 35.2 mm — 20° — 630 – 670 nm
DE-R 286 QC-Line – 30@660 660 nm 54.6 mm — 30.5° — 600 – 700 nm
DE-R 287 QC-Line – 45@660 660 nm 83.9 mm — 45.5° — 600 – 700 nm
DE-R 337 1:99 Dot Line 635 nm 49.3 mm 0.5 27.7° 0.3° 600 – 700 nm
DE-R 364 QC-Line – 45@940 940 nm 83.0 mm — 45.0° — 890 – 980 nm
DE-R 369 QC-Line – 36@640 639 nm 65.0 mm — 36.0° — 600 – 700 nm
DE-R 383 QC-Line – 51@840 840 nm 95.0 mm — 50.6° — 790 – 880 nm
Crosshair
Pattern Size@ 100 mm Distance (@ Design Wavelength) Pattern Angles (@ Design Wavelength)
DOE Item # Specs Description Design Wavelength a α Optimum Wavelength Range Image
DE-R 205 Cross – 5@650 650 nm 8.7 mm 5° 580 – 660 nm
DE-R 212 Cross – 25@532 532 nm 45.1 mm 25.4° 500 – 640 nm
DE-R 214 Cross – 2@645 645 nm 3.4 mm 2.0° 600 – 645 nm
DE-R 218 Cross – 15@640 640 nm 26.3 mm 15.0° 500 – 640 nm
DE-R 239 Cross – 5@520 520 nm 8.7 mm 5.0° 488 – 600 nm
DE-R 245 Cross – 10@633 633 nm 17.5 mm 10.0° 570 – 690 nm
DE-R 246 Cross with surrounding
high contrast area -@633 633 nm 17.5 mm 10.0° 530 – 670 nm
DE-R 247 Cross – 25@645 645 nm 44.3 mm 25.0° 600 – 800 nm
DE-R 248 Cross – 37@645 645 nm 66.8 mm 37.0° 630 – 700 nm
DE-R 249 Cross – 45@633 633 nm 83.0 mm 45.0° 500 – 640 nm
DE-R 270 Cross – 30@640 640 nm 53.6 mm 30.0° 580 – 650 nm
DE-R 280 Cross – 60@635 635 nm 115.5 mm 60.0° 580 – 690 nm
DE-R 289 Cross – 15@520 520 nm 26.4 mm 15.0° 480 – 550 nm
DE-R 299 Cross – 75@650 650 nm 153.5 mm 75.0° 600 – 700 nm
DE-R 340 Cross – 60@450 450 nm 116.1 mm 60.3° 420 – 520 nm
DE-R 342 Cross – 52@515 515 nm 97.6 mm 52.0° 440 – 540 nm
DE-R 382 Cross – 30@450 450 nm 53.6 mm 30.0° 440 – 480 nm
Dot Matrix
Pattern Size @ 100 mm Distance (@ Design Wavelength) Pattern Angles (@ Design Wavelength)
DOE Item # Specs Description Design Wavelength a b c d α β γ δ Optimum Wavelength Range Image
DE-R 206 17 x 17 Dots 660 nm 38.0 mm 26.6 mm 1.7 mm 26.6 mm 21.5° 15.2° 0.9° 15.2°
DE-R 223 2 x 2 + 1 Dots 635 nm 28.3 mm 19.9 mm 19.9 mm 19.9 mm 16.1° 11.4° 11.4° 11.4°
DE-R 231 101 x 101 Dots 660 nm 12.8 mm 9.1 mm 0.1 mm 9.1 mm 7.4° 5.2° 0.05° 5.2°
DE-R 241 21 x 21 Dots 635 nm 11.9 mm 8.4 mm 0.4 mm 8.4 mm 6.8° 4.8° 0.2° 4.8°
DE-R 242 16 x 16 Dots 635 nm 12.4 mm 8.8 mm 0.6 mm 8.8 mm 7.1° 5.0° 0.3° 5.0°
DE-R 243 17 x 17 Dots 635 nm 12.4 mm 8.8 mm 0.5 mm 8.8 mm 7.1° 5.0° 0.3° 5.0°
DE-R 244 13 x 13 Dots 635 nm 7.4 mm 5.3 mm 0.4 mm 5.3 mm 4.3° 3.0° 0.3° 3.0°
DE-R 257 51 x 51 Dots 660 nm* 56.9 mm 40.3 mm 0.8 mm 40.3 mm 31.8° 22.8° 0.5° 22.8°
DE-R 258 11 x 11 Dots 635 nm* 71.2 mm 50.3 mm 5.0 mm 50.3 mm 39.2° 28.2° 2.8° 28.2°
DE-R 339 6 x 6 Dots 635 nm 16.6 mm 11.7 mm 2.3 mm 11.7 mm 9.5° 6.7° 1.3° 6.7° 590 – 690
DE-R 351 10 x 10 Dots 532 nm 21.1 mm 14.9 mm 3.3 mm 14.9 mm 23.8° 17.0° 1.9° 17.0°
DE-R 352 4 x 6 Dots 532 nm 26.6 mm 13.7 mm 4.6 mm 22.8 mm 15.1° 7.8° 2.6° 13.6° 500 – 580
DE-R 353 5 x 5 Dots 690 nm 1.1 mm 0.75 mm 0.19 mm 0.75 mm 0.61° 0.43° 0.11° 0.43° 630 – 750
DE-R 388 51 x 51 Dots 532 nm* 46.8 mm 33.1 mm 0.66 mm 33.1 mm 26.4° 18.8° 0.38° 18.8°
DE-R 389
21 x 21 Dots 520 nm* 46.8 mm 33.1 mm 1.66 mm 33.1 mm 26.4° 18.8° 0.95° 18.8° 480 – 600 nm
*Large-angle pattern that due to its symmetry properties is subject to geometrical distortion, if the DOE is used at laser wavelengths significantly different (Δλ > 50nm) from the design wavelength.
Circles & Dot Circles
Pattern Size @ 100 mm Distance (@ Design Wavelength) Pattern Angles (@ Design Wavelength)
DOE Item # Specs Description Design Wavelength a b α β Optimum Wavelength Range Image
DE-R 219 Solid Line Circle 592 nm 55.8 mm — 31.2° — 480 – 600 nm
DE-R 220 1 : 16 Dot Circle 515 nm 81.9 mm 16.1 mm 44.5° 9.2° 480 – 532 nm
DE-R 221 1:72 Dot Circle 532 nm 36.9 mm 1.6 mm 20.9° 0.9° 400 – 570 nm
DE-R 229 1:36 Dot Circle 532 nm 6.1 mm 0.5 mm 3.5° 0.3° 480 – 560 nm
DE-R 238 Solid Line Circle 520 nm 6.0 mm — 3.4° — 520 – 532 nm
DE-R 240 1:16 Dot Circle 635 nm 18.9 mm 3.7 mm 10.8° 2.1° 530 – 700 nm
DE-R 268 Solid Line Circle 488 nm 77.0 mm — 42.1° — 488 – 532 nm
Random Dot Patterns
Random Dot Pattern Diffractive Optical Elements
Pattern Size @ 100 mm Distance (@ Design Wavelength) Pattern Angles (@ Design Wavelength)
DOE Item # Specs Description Design Wavel. a b d α β δ Optimum Wavelength Range Image
DE-R 332 33000-Dot Pseudo-Random 830 nm* 136.9 mm 114.6 mm 76.3 mm 68.8° 59.6° 41.7° 820 – 850
DE-R 335 33000-Dot Pseudo-Random 645 nm* 101.3 mm 84.8 mm 56.4 mm 53.7° 45.9° 31.5° 630 – 660
DE-R 372 40100-Dot Pseudo-Random 850 nm* 135.6 mm 114.9 mm 72.0 mm 68.3° 59.7° 39.6° 825 – 870
DE-R 373 31806-Dot Truely-Random 830 nm* 146.9 mm 118.5 mm 86.9 mm 72.6° 61.3° 47.0° 800 – 890
DE-R 374 47708-Dot Truely-Random 830 nm* 146.9 mm 118.5 mm 86.9 mm 72.6° 61.3° 47.0° 800 – 890
DE-R 375 29594-Dot Pseudo-Random 830 nm* 146.7 mm 118.5 mm 86.5 mm 72.5° 61.3° 46.8° 810 – 850
DE-R 384 51978-Dot Truely-Random 640 nm* 162.8 mm 97.5 mm 130.4 mm 78.3° 52.0° 66.2° 610 – 660
DE-R 385 101050-Dot Truely-Random 640 nm* 167.4 mm 100.4 mm 133.9 mm 79.9° 53.3° 67.6° 610 – 660
Viewfinder
DOE Item # Specs Description Design Wavelength Pattern Size @ 100 mm Distance (@ Design Wavelength) Pattern Angles (@ Design Wavelength) Optimum Wavelength Range Image
DE-R 215 Viewfinder 645 nm Width: 27 mm
DE-R 234 Viewfinder (Lines Square) 633 nm* Width: 61 mm
DE-R 260 Viewfinder (Circle + Cross) 645 nm Width Cross: 37 mm
DE-R 261 Viewfinder (Dot Circle + Cross) 635 nm Width Cross: 11 mm
DE-R 262 Viewfinder (Dot Square) 532 nm Width: 12.3 mm
DE-R 288 Viewfinder 650 nm Width: 83.0 mm
DE-R 345
DE-R 394 Viewfinder 520 nm Width: 65.9 mm
DOE Item # Specs Description Design Wavelength Pattern Size @ 100 mm Distance (@ Design Wavelength) Pattern Angles (@ Design Wavelength) Optimum Wavelength Range Image
DE-R 236 Solid Line Square 633 nm* Width: 60.2 mm
DE-R 256 Square Grid 51 x 51 Lines 660 nm Width: 39 mm
DE-R 259 5 Rings 645 nm Width: 51 mm
DE-R 269 10 Rings 515 nm Width: 96.2 mm
DE-R 285 Hexagon 780 nm Width: 13.1 mm Width: 7.5° 520 – 800 nm
DE-R 354 Square Grid 10×10 Lines 658 nm Width: 72.8 mm
DE-R 396
DE-R 397
STANDARD DOE (GLASS) 標(biāo)準(zhǔn)DOE（玻璃）
DE 801
DE 802
DE 803
DE-R 440
DE 804
GAEA-2 1000萬(wàn)像素僅限相位LCOS-SLM（反射式）
Device Wavelength Range Fill Factor
GAEA-2-VIS-036 420 – 650 nm 90 %
GAEA-2-NIR-069 650 – 1100 nm 90 %
GAEA-2-TELCO-033 1400 – 1700 nm 90 %
GAEA-2 4K LCOS SLM Kit
GAEA-2 LCOS-SLM
PLUTO-2 LCOS空間光調(diào)制器僅相位（反射）
PLUTO-2-UV-099 350 – 420 nm 90 % 2.8 Pi @ 355 nm
PLUTO-2-VIS-014 420 – 650 nm 65 % 3.9 Pi @ 530
PLUTO-2-VIS-016 420 – 650 nm 67 % 6.7 Pi @ 530 nm
PLUTO-2-VIS-096 450 – 650 nm 95-98 % 3.1 Pi @ 530 nm
PLUTO-2-NIR-011 420 – 1100 nm 65-75 % 4.5 Pi @ 530 nm
PLUTO-2-NIR-015 650 – 1100 nm 65-73 % 4.4 Pi @ 850 nm
PLUTO-2-NIR-080 730 – 950 nm 95 % 4.8 Pi @ 800 nm
PLUTO-2-NIR-149 1000 – 1100 nm 93 % 2.5 Pi @ 1064 nm
PLUTO-2-NIRO-023 1000 – 1400 nm 74 % 4.1 Pi @ 1400 nm
PLUTO-2-TELCO-013 1400 – 1700 nm 80 % 3.5 Pi @ 1550 nm
PLUTO-2-TELCO-059 1500 – 1600 nm 90 % 2.9 Pi @ 1550 nm
PLUTO-2 Spatial Light Modulator Kit
PLUTO-2.1-UV-099 350 – 500 nm 90 %
PLUTO-2.1-VIS-014 420 – 650 nm 65 % 4.2 Pi @ 530
PLUTO-2.1-VIS-130 500 – 670 nm 94 % (average) 3.2 Pi @ 530 nm
PLUTO-2.1-NIR-015 650 – 1100 nm 65-73 % 5.4 Pi @ 800 nm
PLUTO-2.1-NIR-118 730 – 950 nm 95 % 3.1 Pi @ 800 nm Dielectric Mirror, Higher Power Use
PLUTO-2.1-NIR-149 1000 – 1100 nm 93 % 2.9 Pi @ 1064 nm Dielectric Mirror, Higher Power Use
PLUTO-2.1-NIRO-023 1000 – 1400 nm 74 % 4.2 Pi @ 1300 nm
PLUTO-2.1-TELCO-013 1400 – 1700 nm 80 % 3.9 Pi @ 1550 nm
PLUTO-2.1-TELCO-059 1500 – 1600 nm 90 % 3.1 Pi @ 1550 nm Dielectric Mirror
LETO純相位空間光調(diào)制器（反射式）
LETO-VIS-009 420 – 800 nm ~75 % 3.7 Pi @ 530 nm
LETO-VIS-017 420 – 650 nm ~75 % min 2 Pi @ visible range
LETO-NIR-081 650 – 1100 nm 62-70% 4.4 Pi @ 650 nm
LC 2012空間光調(diào)制器（透射式）
LC 2012
OPTIXPLORER–光學(xué)教育套件
SLM軟件
SLM熱管理系統(tǒng)
TMS 001：帶風(fēng)冷散熱器的熱管理系統(tǒng)
TMS 002：帶水冷散熱器的熱管理系統(tǒng)
停產(chǎn)設(shè)備
LC-R 720，LC-R 1080，LC 2002，LC-R 2500，HEO 1080P，LC-R 768，LC-R 3000
微顯示技術(shù)
HED 6001單色LCOS微顯示器
HED 2200彩色LCOS微顯示器
HED 5216彩色LCOS微顯示器
HED 7200彩色LCOS微顯示器
HED 5201單色LCOS微顯示器
HED 1316彩色LCOS微顯示器
HED 1016彩色液晶顯示器
HOLOEYE的空間光調(diào)制器（SLM）系統(tǒng)基于半透明或反射式液晶微顯示器。HOLOEYE為振幅和相位調(diào)制提供了廣泛的空間光調(diào)制器。
GAEA-2 1000萬(wàn)像素僅限相位LCOS-SLM（反射式）
Device Wavelength Range Fill Factor
GAEA-2-VIS-036 420 – 650 nm 90 %
GAEA-2-NIR-069 650 – 1100 nm 90 %
GAEA-2-TELCO-033 1400 – 1700 nm 90 %
GAEA-2 4K LCOS SLM Kit
GAEA-2 LCOS-SLM
PLUTO-2 LCOS空間光調(diào)制器僅相位（反射）
PLUTO-2-UV-099 350 – 420 nm 90 % 2.8 Pi @ 355 nm
PLUTO-2-VIS-014 420 – 650 nm 65 % 3.9 Pi @ 530
PLUTO-2-VIS-016 420 – 650 nm 67 % 6.7 Pi @ 530 nm
PLUTO-2-VIS-096 450 – 650 nm 95-98 % 3.1 Pi @ 530 nm
PLUTO-2-NIR-011 420 – 1100 nm 65-75 % 4.5 Pi @ 530 nm
PLUTO-2-NIR-015 650 – 1100 nm 65-73 % 4.4 Pi @ 850 nm
PLUTO-2-NIR-080 730 – 950 nm 95 % 4.8 Pi @ 800 nm
PLUTO-2-NIR-149 1000 – 1100 nm 93 % 2.5 Pi @ 1064 nm
PLUTO-2-NIRO-023 1000 – 1400 nm 74 % 4.1 Pi @ 1400 nm
PLUTO-2-TELCO-013 1400 – 1700 nm 80 % 3.5 Pi @ 1550 nm
PLUTO-2-TELCO-059 1500 – 1600 nm 90 % 2.9 Pi @ 1550 nm
PLUTO-2 Spatial Light Modulator Kit
LETO純相位空間光調(diào)制器（反射式）
LETO-VIS-009 420 – 800 nm ~75 % 3.7 Pi @ 530 nm
LETO-VIS-017 420 – 650 nm ~75 % min 2 Pi @ visible range
LETO-NIR-081 650 – 1100 nm 62-70% 4.4 Pi @ 650 nm
LC 2012空間光調(diào)制器（透射式）
LC 2012
OPTIXPLORER–光學(xué)教育套件
SLM軟件
SLM熱管理系統(tǒng)
TMS 001：帶風(fēng)冷散熱器的熱管理系統(tǒng)
TMS 002：帶水冷散熱器的熱管理系統(tǒng)
停產(chǎn)設(shè)備
LC-R 720，LC-R 1080，LC 2002，LC-R 2500，HEO 1080P，LC-R 768，LC-R 3000
微顯示技術(shù)
HED 6001單色LCOS微顯示器
HED 2200彩色LCOS微顯示器
HED 5216彩色LCOS微顯示器
HED 7200彩色LCOS微顯示器
HED 5201單色LCOS微顯示器
HED 1316彩色LCOS微顯示器
HED 1016彩色液晶顯示器
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